Cover is for reference only

Metrology, inspection, and process control for microlithography XVI：4-7 March, 2002, Santa Clara, [California] USA

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Bibliographic Details
Corporate Authors: Semiconductor Equipment and Materials International; International SEMATECH; Society of Photo-Optical Instrumentation Engineers
Group Author: Herr Daniel J. C
Published: SPIE,
Publisher Address: Bellingham, Washington
Publication Dates: c2002.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 4689
Subjects:
Integrated circuits > Measurement
Microlithography
Process control
Integrated circuits > Inspection
Carrier Form: 2 v. (xl, 1204 p.): ill. (some col.) ; 28 cm.
ISBN: 0819444359
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/M594/2002
Contents: Includes bibliographical references and author index.

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