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Photomask and X-ray mask technology III：18-19 April, 1996, Kawasaki City, Kanagawa, Japan

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Bibliographic Details
Corporate Authors: BACUS (Technical group); Society of Photo-optical Instrumentation Engineers. Japan Chapter.; Photomask Japan.
Group Author: Yoshihara Hideo.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c1996.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 2793
Subjects:
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Masks (Electronics) > Congresses.
Carrier Form: xiii, 530 p.: ill. ; 28 cm.
ISBN: 0819421790
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/P575/1996/
Contents: Includes bibliographic references and index.

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