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Design-process-technology co-optimization for manufacturability XI : 1-2 March 2017, San Jose, California, United States /

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Bibliographic Details
Corporate Authors: Design Process Technology Co-Optimization for Manufacturability Conference San Jose, California, United States; Hitachi High Technologies America, Inc. United States; SPIE Society
Group Author: Capodieci, Luigi; Cain, Jason P
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2017]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 10148
Subjects:
Semiconductor wafers > Defects > Analysis > Congresses
Semiconductors > Design and construction > Congresses
Integrated circuits > Defects > Analysis > Congresses
Integrated circuits > Design and construction > Congresses
Microelectronics industry > Quality control > Congresses
Quality control > Congresses
Item Description: "SPIE advanced lithography" -- Cover.
Carrier Form: 1 volume (various pagings) : illustrations ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510607477 (paperback) :
CLC: TN43-532
Call Number: TN43-532/D457/2017

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