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Language: English

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A production-compatible microelectronic test pattern for evaluating photomask misalignment /

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Bibliographic Details
Main Authors: Russell, T. J. (Thomas James), 1943- (Author)
Corporate Authors: United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Group Author: Maxwell, Dwight A.
Published: U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off.,
Publisher Address: Washington :
Publication Dates: 1979.
Literature type: Book
Language: English
Series: Semiconductor measurement technology
NBS special publication ; 400-51
Subjects:
Integrated circuits > Masks > Testing.
Carrier Form: iii, 28 pages : illustrations ; 26 cm.
Bibliography: Includes bibliographical references.
Index Number: QC100
CLC: TN4
Call Number: TN4/R967

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