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Language: Chinese

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Materials and processes for next generation lithography /

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Bibliographic Details
Group Author: Robinson, Alex (Editor); Lawson, Richard (Editor)
Published: Elsevier,
Publisher Address: Amsterdam :
Publication Dates: [2016]
Literature type: Book
Language: English
Series: Frontiers of nanoscience ; volume 11, 1876-2778
Subjects:
Nanolithography
Photoresists
Microlithography
Carrier Form: xxv, 608 pages : illustrations ; 25 cm.
Bibliography: Includes bibliographical references and index.
ISBN: 9780081003541
0081003544
Index Number: TK7872
CLC: TN405
Call Number: TN405/M425

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