Vacuum technology and applications /

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Bibliographic Details
Main Authors: Hucknall, D. J
Corporate Authors: Elsevier Science & Technology
Published: Butterworth-Heinemann,
Publisher Address: Oxford ; Boston :
Publication Dates: 1991.
Literature type: eBook
Language: English
Subjects:
Online Access: http://www.sciencedirect.com/science/book/9780750611459
Carrier Form: 1 online resource (vii, 319 pages) : illustrations
Bibliography: Includes bibliographical references and index.
ISBN: 9781483103334
1483103331
Index Number: TJ940
CLC: TB7
Contents: ""Front Cover""; ""Vacuum Technology and Applications""; ""Copyright Page""; ""Table of Contents""; ""Preface""; ""Acknowledgments""; ""Chapter 1. Introduction""; ""1.1 General""; ""1.2 The gaseous state""; ""1.3 Gas flow""; ""1.4 Vacuum system characteristics""; ""References""; ""Chapter 2. Vacuum pumps (rougha ?medium range)""; ""2.1 General introduction""; ""2.2 Rotary pumps""; ""2.3 Roots vacuum pumps""; ""2.4 Dry vacuum pumps""; ""References""; ""Chapter 3. Vacuum pumps (higha ?ultra-high range) ""; ""3A 1 General introduction""; ""3.2 Gas transfer pumps""; ""3.3 Entrapment pumps""
""7.2 Vacuum technology in the semiconductor industry""""7.3 Vacuum technology in metallurgical processes""; ""7.4 Vacuum technology in the chemical industry""; ""References""; ""Chapter 8. Appendix: units, conversion factors and other data""; ""8.1 Units of pressure""; ""8.2 Amount of substance""; ""8.3 PNEUROP specifications for the characterization of vacuum pumps""; ""Index""