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Submicron lithography

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Bibliographic Details
Corporate Authors: International Society for Hybrid Microelectronics; Northern California Microphotomask/Masking Working Group; Materials Research Society
Group Author: Blais Phillip D
Published: International Society for Optical Engineering,
Publisher Address: Bellingham, Wash.
Publication Dates: 1982.
Literature type: Book
Language: English
Series: Proceedings of SPIE--the International Society for Optical Engineering ; v. 333
Subjects:
Photoresists > Congresses
Photolithography > Congresses
Carrier Form: viii, 179 p.: ill. ; 28 cm.
ISBN: 0892523689 (pbk.)
Index Number: TS82
CLC: TS82-532
Call Number: TS82-53/S941/
Contents: Includes bibliographical references and indexes.

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