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Metrology, inspection, and process control for microlithography XXII：25-28 February 2008, San Jose, California, USA

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Bibliographic Details
Corporate Authors: International SEMATECH.; Society of Photo-Optical Instrumentation Engineers
Group Author: (John Alexander); Raymond Christopher J.; Allgair John A.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2008.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 6922
Subjects:
Integrated circuits > Measurement.
Microlithography.
Process control.
Integrated circuits > Inspection
Carrier Form: 2 v.: ill. ; 28 cm.
ISBN: 9780819471079 (pbk.)
0819471070
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/M594/2008/pt.1
Contents: Includes bibliographical references and author index.

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