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Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /

Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processin...

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Bibliographic Details
Main Authors: Mattox, D. M
Corporate Authors: Elsevier Science & Technology
Published: Noyes Publications,
Publisher Address: Westwood, N.J. :
Publication Dates: 1998.
Literature type: eBook
Language: English
Subjects:
Vapor-plating > Handbooks, manuals, etc
Vapor-plating
Galvanoplastia
Manuais
Electronic books
Handbooks and manuals
Online Access: http://www.sciencedirect.com/science/book/9780815514220
Summary: Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processing. Also covers the more widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes.
Carrier Form: 1 online resource (xxvii, 917 pages) : illustrations
Bibliography: Includes bibliographical references and index.
ISBN: 1591240794
9781591240792
9780815514220
0815514220
Index Number: TS695
CLC: TG174.444-62
Contents: Introduction -- Substrate (""Real"") Surfaces and Surface Modification -- The Low-Pressure Gas and Vacuum Processing Environment -- The Low-Pressure Plasma Processing Environment -- Vacuum Evaporation and Vacuum Deposition -- Physical Sputtering and Sputter Deposition (Sputtering) -- Arc Vapor Deposition -- Ion Plating and Ion Beam Assisted Deposition -- Atomistic Film Growth and Some Growth-Related Film Properties -- Film Characterization and Some Basic Film Properties -- Addhesion and Deadhesion -- Cleaning -- External Processing Environment -- APPENDIX 1: Reference Material -- APPENDIX 2:

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