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Extreme Ultraviolet Lithography 2020 : 21-25 September 2020, online only, United States /

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Bibliographic Details
Corporate Authors: Extreme Ultraviolet Lithography online only, United States; SPIE Society
Group Author: Itani, Toshiro; Gargini, Paolo A; Naulleau, Patrick P; Ronse, Kurt G
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2020]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 11517
Subjects:
Extreme ultraviolet lithography > Congresses
Ultraviolet radiation > Industrial applications > Congresses
Item Description: "SPIE photomask technology + EUV lithography"--Cover.
Carrier Form: 1 volume (various pagings) : illustrations ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510638426
CLC: TN41-532
Call Number: TN41-532/I613/2020

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