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Photomask and next-generation lithography mask technology VII：12-13 April 2000, Yokohama, Japan

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Bibliographic Details
Corporate Authors: Society of Photo-Optical Instrumentation Engineers; Ōyō Butsuri Gakkai.; Seimitsu Kōgakkai.; Denki Gakkai (1888); Semiconductor Equipment and Materials International (Japan); Photomask Japan.; BACUS (Technical group)
Group Author: Morimoto Hiroaki.
Published: SPIE,
Publisher Address: Bellingham, Wash., USA
Publication Dates: c2000.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 4066
Subjects:
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
Carrier Form: xv, 750 p.: ill. ; 28 cm.
ISBN: 0819437026
Index Number: TN305
CLC: TN305.7-532
TN405.7-532
Call Number: TN305.7-532/P757/2000
Contents: Earlier proceedings have title: Photomask and X-ray mask technology.
Includes bibliographical references and index.

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