Industrial applications of ultrafast lasers /

This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor ma...

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Bibliographic Details
Main Authors: Haight, Richard
Group Author: Carr, Adra V
Published: World Scientific Publishing Co. Pte. Ltd.,
Publisher Address: Singapore :
Publication Dates: [2018]
Literature type: Book
Language: English
Series: World Scientific series in materials and energy, volume 11
Subjects:
Summary: This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered
Carrier Form: xii, 193 pages : illustrations (some color) ; 26 cm.
Bibliography: Includes bibliographical references and index.
ISBN: 9789814569002
9814569003
Index Number: TA1677
CLC: TN248
Call Number: TN248/H149
Contents: Ultrafast laser systems -- High-harmonic generation18 with femtosecond light -- Femtosecond photoelectron spectroscopy: fundamentals and electron dynamics -- Femtosecond ablation and mask repair -- Femtosecond photovoltage spectroscopy and device physics -- Survey of ultrafast light sources, applications, and final thoughts.