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2000 5th International Symposium on Plasma Process-Induced Damage：May 22-24, 2000, Santa Clara, California, USA

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Bibliographic Details
Corporate Authors: International Symposium on Plasma Process-Induced Damage (5th 2000 Santa Clara, California; American Vacuum Society; IEEE Electron Devices Society; Ōyō Butsuri Gakkai
Group Author: Koyanagi Mitsumasa; Engelhardt Manfred; Gabriel Calvin T
Published: Northern California Chapter of the American Vacuum Society,
Publisher Address: Santa Clara, California
Publication Dates: c2000.
Literature type: Book
Language: English
Subjects:
Semiconductor wafers
Semiconductors > Effect of radiation on
Plasma radiation
Carrier Form: [6], i, 172 p.: ill. ; 28 cm.
ISBN: 0965157741
Index Number: TN405
CLC: TN405.98-532
Call Number: TN405.98-532/I61/2000
Contents: PID--cover.
"IEEE Catalog Number 00TH8479"--verso of T.p.
Includes bibliographic references and author index.

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