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The Physics and chemistry of SiO2 and the Si-SiO2 interface 2

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Bibliographic Details
Corporate Authors: Electrochemical Society. Dielectric Science and Technology Division.; Symposium on the Physics and Chemistry of the SiO b2 s and Si-SiO b2 s Interface 1992 St. Louis, Mo.) (St. Louis, Mo.)); Electrochemical Society. Electronics Division.
Group Author: Deal Bruce E.; Helms C. Robert.
Published: Plenum Press,
Publisher Address: New York
Publication Dates: c1993.
Literature type: Book
Language: English
Subjects:
Dielectrics > Surfaces > Congresses.
Silicon dioxide films > Congresses.
Surface chemistry > Congresses.
Surfaces (Technology) > Congresses.
Silica > Surfaces > Congresses.
Carrier Form: xvi, 503 p.: ill. ; 26 cm.
ISBN: 0306444194
Index Number: O613
CLC: O613.72-532
Call Number: O613.72-53/P578/1992/
Contents: Proceedings of the Second Symposium on the Physics and Chemistry of the SiO2 and Si-SiO2 Interface, held May 18-21, 1992, in St. Louis, Missouri, sponsored by the Electronics Division and the Dielectric Science and Technology Division of the Electrochemical Society.
Includes bibliographical references and indexes.

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