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Photomask technology 2019 : 16-18 September 2018, Monterey, California, United States /

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Bibliographic Details
Corporate Authors: Photomask Technology Conference Monterey, California, United States; BACUS Technical group‏; SPIE Society
Group Author: Rankin‏, Jed H; Preil, Moshe E
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2019]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 11148
Subjects:
Integrated circuits > Masks > Congresses
Masks Electronics > Congresses
Microlithography > Congresses
Item Description: "SPIE photomask technology + EUV lithography"--Cover.
Carrier Form: 1 volume (various pagings) : illustrations ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510629998
CLC: TN305.7-532
Call Number: TN305.7-532/S989-2/2018

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