Screen LibrarySilicon technologies：ion implantation and thermal treatment
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| Group Author: | |
|---|---|
| Published: |
ISTE Wiley,
|
| Publisher Address: | London Hoboken, NJ |
| Publication Dates: | 2011. |
| Literature type: | Book |
| Language: | English |
| Subjects: | |
| Carrier Form: | xvii, 337 p.: ill. ; 24 cm. |
| ISBN: |
9781848212312 (hc) 1848212313 |
| Index Number: | TN305 |
| CLC: | TN305.3 |
| Call Number: | TN305.3/S583 |
| Contents: |
Includes bibliographical references and index. The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |