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Literature type: Book

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Advances in patterning materials and processes XXXIII : 22-25 February 2016, San Jose, California, United States /

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Bibliographic Details
Corporate Authors: Advances in Patterning Materials and Processes Conference San Jose, California, United States; Tokyo Ohka Kogyo Co. United States; SPIE Society
Group Author: Hohle, Christoph H; Younkin, Todd R
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2016]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 9779
Subjects:
Photoresists > Congresses
Microlithography > Congresses
Item Description: "SPIE advanced lithography"--Cover.
Carrier Form: 1 volume (various pagings) : illustrations, forms ; 28 cm.
Bibliography: Includes bibliographical references and author index.
ISBN: 9781510600140 (paperback) :
1510600140 (paperback)
CLC: TS82-532
Call Number: TS82-532/A244/2016

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