Thin metal films and gas chemisorption /
The last decade has seen an explosive growth in research on the physics and chemistry of metal surfaces. With the advent of modern spectroscopic methods several aspects of metallic surfaces and their interactions with gases could be explained. The standard of clean surfaces required for basic resear...
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Corporate Authors: | |
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Group Author: | |
Published: |
Elsevier ; Distributors for the U.S. and Canada, Elsevier Science Pub. Co.,
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Publisher Address: | Amsterdam ; New York : New York, NY, U.S.A. : |
Publication Dates: | 1987. |
Literature type: | eBook |
Language: | English |
Series: |
Studies in surface science and catalysis ;
vol. 32 |
Subjects: | |
Online Access: |
http://www.sciencedirect.com/science/bookseries/01672991/32 |
Summary: |
The last decade has seen an explosive growth in research on the physics and chemistry of metal surfaces. With the advent of modern spectroscopic methods several aspects of metallic surfaces and their interactions with gases could be explained. The standard of clean surfaces required for basic research were obtained essentially in two ways: (a) By ion-bombardment and proper heat treatment of single crystals, and (b) By depositing thin films on suitable substrates under UHV conditions. Chemisorption studies have concentrated on single crystal surfaces largely because of the inherent simplicity |
Carrier Form: | 1 online resource (xviii, 538 pages) : illustrations. |
Bibliography: | Includes bibliographical references and index. |
ISBN: |
9780444428004 0444428003 9780080960661 0080960669 |
Index Number: | QD547 |
CLC: | O647.31 |