Screen LibraryHandbook of cleaning for semiconductor manufacturing：fundamentals and applications
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| Main Authors: | |
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| Group Author: | |
| Published: |
John Wiley & Sons, Inc.,
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| Publisher Address: | Salem, Mass. Scrivener Hoboken, N.J. |
| Publication Dates: | c2011. |
| Literature type: | Book |
| Language: | English |
| Subjects: | |
| Carrier Form: | xxii, 590 p.: ill. ; 26 cm. |
| ISBN: |
9780470625958 (hbk.) 0470625953 9781118071748 (electronic bk.) 1118071743 (electronic bk.) |
| Index Number: | TN305 |
| CLC: | TN305-62 |
| Call Number: | TN305-62/R369 |
| Contents: |
Includes bibliographical references and index. Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations. |