Cover is for reference only

Photomask and next-generation lithography mask technology X：16-18 April, 2003, Yokohama, Japan

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Bibliographic Details
Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Tanabe Hiroyoshi.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2003.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 5130
Subjects:
Integrated circuits > Masks.
X-ray lithography
Microlithography.
Masks (Electronics)
Carrier Form: xxi, 1066 p.: ill. (some col.) ; 28 cm.
ISBN: 0819449962
Index Number: TN405
CLC: TN405.7-532
TN305.7-532
Call Number: TN305.7-532/P757/2003
Contents: Some earlier proceedings have title: Photomask and X-ray mask technology.
Includes bibliographical references and author index.

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