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Analytical techniques for thin films /

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Bibliographic Details
Corporate Authors: Elsevier Science & Technology.
Group Author: Tu, K. N. (King-Ning), 1937-; Rosenberg, R.
Published: Academic Press,
Publisher Address: Boston :
Publication Dates: 1988.
Literature type: eBook
Language: English
Series: Treatise on materials science and technology ; v. 27
Subjects:
Thin films > Technique.
Couches minces.
Bombardement ionique > Applications scientifiques.
Faisceaux e lectroniques > Applications scientifiques.
Rayons X > Applications scientifiques.
Electronic books.
Online Access: http://www.sciencedirect.com/science/bookseries/01619160/27
Carrier Form: 1 online resource (xi, 493 pages) : illustrations.
Bibliography: Includes bibliographical references and index.
ISBN: 9780123418272
0123418275
Index Number: TA403
CLC: TB3
Contents: Submicron structure and microanalysis / K.N. Tu and R. Rosenberg -- Synchrotron radiation photoemission studies of interfaces / J.H. Weaver -- Contact x-ray microscopy / R. Feder and D.M. Shinozaki -- X-ray diffraction analysis of stress and strain in thin films / A. Segmuller and M. Murakami --X-ray diffraction analysis of diffusion in thin films / M. Murakami, A. Segmuller, and K.N. Tu -- ESCA / N. Martensson -- Cross-sectional transmission electron microscopy of electronic and photonic devices / T.T. Sheng -- High resolution transmission electron microscopy of surfaces and interfaces / D. Cherns -- Scanning transmission electron microscopy / P. Batson -- Rutherford backscattering spectrometry on thin solid films / T.G. Finstad and W.K. Chu -- Atomic structure and atomic layer compositional analysis of thin solid films using time-of-flight atom-probe field ion microscopy / T.T. Tsong.

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