Reset Filters
Branch: 上海图书馆

Cover is for reference only

Photomask technology 2017 : 11-14 September 2017, Monterey, California, United States /

Saved in:
Bibliographic Details
Corporate Authors: Photomask Technology Conference Monterey, California, United States; BACUS Technical group‏; SPIE Society
Group Author: Buck, Peter D.‏; Gallagher, Emily E
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2017]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 10451
Subjects:
Integrated circuits > Masks > Congresses
Masks Electronics > Congresses
Microlithography > Congresses
Item Description: "SPIE photomask technology + EUV lithography"--Cover.
Carrier Form: 1 volume (various pagings) : illustrations ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510613768 (paperback) :
CLC: TN305.7-532
Call Number: TN305.7-532/S989-2/2017

Related Book Recommendations