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Photomask and next-generation lithography mask technology XIII：18-20 April, 2006, Yokohama, Japan

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Bibliographic Details
Corporate Authors: BACUS (Technical group); ?Oy?o Butsuri Gakkai.; Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Hoga Morihisa.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2006.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; 6283
Subjects:
X-ray lithography
Microlithography.
Masks (Electronics)
Integrated circuits > Masks.
Carrier Form: 2 v.: ill. ; 28 cm.
ISBN: 0819463582
Index Number: TN305
CLC: TN305.7-532
TN405.7-532
Call Number: TN305.7-532/P757/2006
Contents: Some earlier proceedings have title: Photomask and X-ray mask technology.
Includes bibliographical references and author index.

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