Photomask technology 2009:14-17 September 2009, Monterey, California, United States

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Bibliographic Details
Corporate Authors: BACUS (Technical group); SPIE (Society)
Group Author: Zurbrick Larry S.; Montgomery M. Warren.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2009.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 7488
Subjects:
Carrier Form: 2 v.: ill. ; 28 cm.
ISBN: 9780819477958
0819477958
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/S989/2009
Contents: Some earlier conferences have the title: Symposium on Photomask Technology, or the title: Annual BACUS Symposium on Photomask Technology, or the title: BACUS Symposium on Photomask Technology.
Includes bibliographical references and index.