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Photomask and next-generation lithography mask technology XVI：8-10 April 2009, Yokohama, Japan

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Bibliographic Details
Corporate Authors: BACUS (Technical group); SPIE (Society); Photomask Japan.
Group Author: Hosono Kunihiro.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2009.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 7379
Subjects:
Integrated circuits > Masks.
X-ray lithography
Microlithography.
Masks (Electronics)
Carrier Form: 1 v. (various pagings): ill. ; 28 cm.
ISBN: 9780819476562
0819476560
Index Number: TN305
CLC: TN305.7-532
TN405.7-532
Call Number: TN305.7-532/P757/2009
Contents: Includes bibliographical references and author index.

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