Cover is for reference only

Metrology, inspection, and process control for microlithography XII：23-25 February 1998, Santa Clara, California

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Bibliographic Details
Corporate Authors: Semiconductor Equipment and Materials International; SEMATECH Organization; Society of Photo-Optical Instrumentation Engineers
Group Author: Singh Bhanwar
Published: SPIE,
Publisher Address: Bellingham, Wash., USA
Publication Dates: c1998.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 3332
Subjects:
Integrated circuits > Measurement > Congresses
Microlithography > Congresses
Process control > Congresses
Integrated circuits > Inspection > Congresses
Carrier Form: xv, 744 p.: ill. ; 28 cm.
ISBN: 0819427772
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/M594/1998/
Contents: Includes bibliographical references and index.

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