Cover is for reference only

Photomask and next-generation lithography mask technology XVII：13-15 April 2010, Yokohama, Japan

Saved in:
Bibliographic Details
Corporate Authors: Photomask Japan.; SPIE (Society)
Group Author: Hosono Kunihiro.
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2010.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 7748
Subjects:
Integrated circuits > Masks.
X-ray lithography
Microlithography.
Masks (Electronics)
Carrier Form: 1 v. (various pagings): ill. ; 28 cm.
ISBN: 0819482382
9780819482389 (pbk.)
Index Number: TN305
CLC: TN305.7-532
TN405.7-532
Call Number: TN305.7-532/P757/2010
Contents: Includes bibliographical references and author index.

Related Book Recommendations