Cover is for reference only

Advances in patterning materials and processes XXXVIII : 22-26 February 2021, Online Only, United States /

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Bibliographic Details
Corporate Authors: Advances in Patterning Materials and Processes (Conference) Online Only, United States); SPIE (Society)
Group Author: Sanders, Daniel P.; Guerrero, Douglas
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2021]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 11612
Subjects:
Microlithography > Congresses.
Photoresists > Congresses.
Item Description: "At SPIE Advanced Lithography" -- Cover.
Carrier Form: 1 volume (various pagings) : illustrations, forms ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510640573 (paperback) :
CLC: TS82-532
Call Number: TS82-532/A244/2021

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