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Semiconductor materials analysis and fabrication process control : proceedings of Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control of the 1992 E-MRS Spring Conference, Strasbourg, France, June 2-5, 1992 /

There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The co...

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Corporate Authors: Symposium D on Diagnostic Techniques for Semiconductor Materials Analysis and Fabrication Process Control Strasbourg, France); Elsevier Science & Technology.; European Materials Research Society.
Group Author: Crean, G. M.; Stuck, R.; Woollam, John A.
Published: North-Holland,
Publisher Address: Amsterdam :
Publication Dates: 1993.
Literature type: eBook
Language: English
Series: European Materials Research Society symposia proceedings ; volume 34
Subjects:
Semiconductors > Analysis > Congresses.
Semiconductors > Quality control > Congresses.
Semiconductors > Optical properties > Congresses.
SCIENCE > Electricity. > Electricity.
Semiconductors > Analysis.
Semiconductors > Optical properties.
Semiconductors > Quality control.
Halbleiter.
Herstellung.
Kongress.
Prozessu berwachung.
Electronic books.
Conference papers and proceedings.
Strassburg (1992)
Online Access: http://www.sciencedirect.com/science/book/9780444899088
Summary: There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Item Description: "Reprinted from Applied surface science 63"--Title page verso.
Carrier Form: 1 online resource (xiv, 338 pages) : illustrations.
Bibliography: Includes bibliographical references and indexes.
ISBN: 9780444596918
0444596917
Index Number: TK7871
CLC: TN304-532

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