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Advanced Etch Technology and Process Integration for Nanopatterning XI : 24-28 April 2022, San Jose, California, United States and 23-27 May 2022, Online /

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Bibliographic Details
Corporate Authors: Advanced Etch Technology and Process Integration for Nanopatterning (Conference) San Jose, California, United States : Online); SPIE (Society)
Group Author: Bannister, Julie (Editor); Mohanty, Nihar (Editor)
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2022]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 12056
Subjects:
Nanoelectronics > Congresses.
Semiconductors > Etching > Congresses.
Plasma etching > Congresses.
Item Description: "At SPIE advanced lithography + patterning" -- Cover.
Carrier Form: 1 volume (various pagings) : illustrations ; 27 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510649873
CLC: TB4-532
Call Number: TB4-532/A244/2022

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