Photomask and next-generation lithography mask technology XI:14-16 April, 2004, Yokohama, Japan
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Corporate Authors: | ; ; ; |
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Published: |
SPIE,
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Publisher Address: | Bellingham, Wash. |
Publication Dates: | c2004. |
Literature type: | Book |
Language: | English |
Series: |
SPIE proceedings series ; v. 5446 |
Subjects: | |
Carrier Form: | 2 v. (xxxiii, 984 p.): ill. ; 28 cm. |
ISBN: | 0819453692 |
Index Number: | TN405 |
CLC: |
TN405.7-532 TN305.7-532 |
Call Number: | TN305.7-532/P757/2004 |
Contents: |
Some earlier proceedings have title: Photomask and X-ray mask technology. Includes author index. |