Materials, technology and reliability for advanced interconnects and low-k dielectrics--2004：symposium held April 13-15, 2004, San Francisco, California, U.S.A

Corporate Authors: Symposim on Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics (2004 San Francisco, Calif.) (San Francisco, Calif.)); Materials Research Society. Meeting (2004 San Francisco, Calif.) (San Francisco, Calif.))
Group Author: (Richard John) 1948-; Carter R. J.
Published: Materials Research Society,
Publication Dates: c2004.
Call Number: TN304-532/M425/2004