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1
A production-compatible microelectronic test pattern for evaluating photomask misalignment /

Cover is for reference only
Main Authors: Russell, T. J. Thomas James, 1943
Corporate Authors: United States. National Bureau of Standards; United States. Advanced Research Projects Agency
Group Author: Maxwell, Dwight A
Published: U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off.,
Publication Dates: 1979.
Call Number: TN4/R967
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2
Automated photomask inspection /

Cover is for reference only
Main Authors: Novotny, Donald B
Group Author: Ciarlo, Dino R
Published: U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off.,
Publication Dates: 1978.
Call Number: TN4/N945
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