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1

Cover is for reference only

Photomask Japan'96：digest of papers : symposium on photomask and X-Ray mask technology III, 18-19 April 1996, Kawasaki, Japan

Published: Kanagawa Science Park,
Publication Dates: 1996.
Call Number: TN305.7-532/P757-1/1996/Dig.

Book

2

Cover is for reference only

Photomask and next-generation lithography mask technology XVII：13-15 April 2010, Yokohama, Japan

Corporate Authors: Photomask Japan.; SPIE (Society)
Group Author: Hosono Kunihiro.
Published: SPIE,
Publication Dates: c2010.
Call Number: TN305.7-532/P757/2010

Book

3

Cover is for reference only

Photomask and next-generation lithography mask technology XVI：8-10 April 2009, Yokohama, Japan

Corporate Authors: BACUS (Technical group); SPIE (Society); Photomask Japan.
Group Author: Hosono Kunihiro.
Published: SPIE,
Publication Dates: c2009.
Call Number: TN305.7-532/P757/2009

Book

4

Cover is for reference only

Photomask and X-ray mask technology III：18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-optical Instrumentation Engineers. Japan Chapter.; Photomask Japan.
Group Author: Yoshihara Hideo.
Published: SPIE,
Publication Dates: c1996.
Call Number: TN305.7-532/P575/1996/

Book

5

Cover is for reference only

Photomask and next-generation lithography mask technology VII：12-13 April 2000, Yokohama, Japan

Corporate Authors: Society of Photo-Optical Instrumentation Engineers; Denki Gakkai (1888); Photomask Japan.; BACUS (Technical group)
Published: SPIE,
Publication Dates: c2000.
Call Number: TN305.7-532/P757/2000

Book

6

Cover is for reference only

Photomask and next-generation lithography mask technology IX：23-25 April, 2002, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Published: SPIE,
Publication Dates: c2001.
Call Number: TN305.7-532/P757/2002

Book

7

Cover is for reference only

Photomask and next-generation lithography mask technology VIII：25-26 April 2001, Yokohama, Japan

Corporate Authors: Society of Photo-Optical Instrumentation Engineers; Photomask Japan.; BACUS (Technical group)
Published: SPIE,
Publication Dates: c2001.
Call Number: TN305.7-532/P757/2001

Book

8

Cover is for reference only

Photomask and next-generation lithography mask technology XV：16-18 April 2008, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Horiuchi Toshiyuki.
Published: SPIE,
Publication Dates: c2008.
Call Number: TN305.7-532/P757/2008

Book

9

Cover is for reference only

Photomask and next-generation lithography mask technology XIV：17-19 April 2007, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Watanabe Hidehiro.
Published: SPIE,
Publication Dates: c2007.
Call Number: TN305.7-532/P757/2007

Book

10

Cover is for reference only

Photomask and next-generation lithography mask technology XIII：18-20 April, 2006, Yokohama, Japan

Corporate Authors: BACUS (Technical group); ?Oy?o Butsuri Gakkai.; Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Hoga Morihisa.
Published: SPIE,
Publication Dates: c2006.
Call Number: TN305.7-532/P757/2006

Book

11

Cover is for reference only

Photomask and next-generation lithography mask technology XII：13-15 April, 2005, Yokohama, Japan

Corporate Authors: BACUS (Technical group); ?Oy?o Butsuri Gakkai.; Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Komuro Masanori.
Published: SPIE,
Publication Dates: c2005.
Call Number: TN305.7-532/P757/2005/v.1

Book

12

Cover is for reference only

Photomask and next-generation lithography mask technology XI：14-16 April, 2004, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Institute of Electrical and Electronics Engineers. Japan Section.; Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Published: SPIE,
Publication Dates: c2004.
Call Number: TN305.7-532/P757/2004

Book

13

Cover is for reference only

Photomask and next-generation lithography mask technology X：16-18 April, 2003, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Tanabe Hiroyoshi.
Published: SPIE,
Publication Dates: c2003.
Call Number: TN305.7-532/P757/2003

Book

14

Cover is for reference only

Photomask and X-ray mask technology VI：13-14 April, 1999, Yokohama, Japan

Corporate Authors: BACUS (Technical group); Photomask Japan.
Published: SPIE,
Publication Dates: c1999.
Call Number: TN305.7-532/D575/1999/

Book

15

Cover is for reference only

Photomask and X-ray mask technology V：9-10 April, 1998, Kawasaki, Japan

Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Aizaki Naoaki.
Published: SPIE,
Publication Dates: c1998.
Call Number: TN305.7-532/P575/1998/

Book

16

Cover is for reference only

Photomask and X-ray mask technology IV：17-18 April 1997, Kawasaki, Japan

Corporate Authors: BACUS (Technical group); Ōyō Butsuri Gakkai; Society of Photo-optical Instrumentation Engineers. Japan Chapter.; Photomask Japan.
Group Author: Aizaki Naoaki.
Published: SPIE,
Publication Dates: c1997.
Call Number: TN305.7-532/P575/1997/

Book

17

Cover is for reference only

Photomask Japan 2018 : XXV Symposium on photomask and next-generation lithography mask technology : 18-20 April 2018, Yokohama, Japan /

Corporate Authors: SPIE Society; Photomask Japan
Group Author: Takehisa, Kiwamu
Published: SPIE,
Publication Dates: [2018]
Call Number: TN305.7-532/P757/2018

Book

18

Cover is for reference only

Photomask and X-ray mask technology II：20-21 April 1995, Kawasaki City, Kanagawa, Japan

Corporate Authors: BACUS Technical group; Society of Photo-Optical Instrumentation Engineers; Photomask Japan
Group Author: Yoshihara Hideo
Published: SPIE,
Publication Dates: c1995.
Call Number: TN305.7-532/P575/1995

Book

19

Cover is for reference only

Photomask Japan 2017 : XXIV Symposium on Photomask and Next-generation Lithography Mask Technology : 5-7 April 2017, Yokohama, Japan /

Corporate Authors: Symposium on Photomask Technology and Next-generation Lithography Mask Technology Yokohama, Japan; SPIE Society; Photomask Japan
Group Author: Takehisa, Kiwamu
Published: SPIE,
Publication Dates: [2017]
Call Number: TN305.7-532/P757/2017

Book

20

Cover is for reference only

Photomask Japan 2015 : photomask and next-generation lithography mask technology XXII : 20-22 April 2015, Yokohama, Japan /

Corporate Authors: SPIE Society; BACUS Technical group; Experimental Manpower Laboratory for Corrections; ��y�� Butsuri Gakkai; Photomask Japan; Seimitsu K��gakkai; City of Yokohama; Technical Exhibit in Cooperation with SEMI; Institute of Electrical Engineering
Group Author: Yoshioka, Nobuyuki
Published: SPIE,
Publication Dates: [2015]
Call Number: TN305.7-532/P757-1/2015

Book

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