Author Results for BACUS Technical group

Society of Photo-Optical Instrumentation Engineers
BACUS Technical group
BACUS (Technical group)
Photomask Japan
Grenon,Brian J
see all »
SPIE (Society)
Behringer,Uwe F. W
Symposium on Photomask Technology,Monterey, Calif
European Mask and Lithography Conference,Dresden, Germany
Maurer,Wilhelm

1
13th Annual Symposium on Photomask Technology and Management proceedings : 22-23 September 1993, Santa Clara, California

Cover is for reference only
Corporate Authors: Symposium on Photomask Technology and Management (13th 1993 Santa Clara, Calif; BACUS Technical group
Published: SPIE--the International Society for Optical Engineering,
Publication Dates: c1994.
Call Number: TN305.7-532/S989/1993
Book
Save to List
Saved in:
2
12th Annual Symposium on Photomask Technology and Management proceedings : 23-24 September 1992, Sunnyvale, California

Cover is for reference only
Corporate Authors: Symposium on Photomask Technology and Management (12th 1992 Sunnyvale, Calif; BACUS Technical group
Published: SPIE--the International Society for Optical Engineering,
Publication Dates: c1993.
Call Number: TN305.7-532/S989/1992
Book
Save to List
Saved in:
8
Photomask technology 2010 13-16 September 2010, Monterey, California, United States

Cover is for reference only
Corporate Authors: SPIE (Society)
Group Author: Montgomery M. Warren.; Maurer Wilhelm.
Published: SPIE,
Publication Dates: c2010.
Call Number: TN305.7-532/S989/2010
Book
Save to List
Saved in:
9
Photomask technology 2009 14-17 September 2009, Monterey, California, United States

Cover is for reference only
Corporate Authors: BACUS (Technical group); SPIE (Society)
Group Author: Zurbrick Larry S.; Montgomery M. Warren.
Published: SPIE,
Publication Dates: c2009.
Call Number: TN305.7-532/S989/2009
Book
Save to List
Saved in:
10
Photomask technology 2008 7-10 October 2008, Monterey, California, USA

Cover is for reference only
Corporate Authors: BACUS Technical group; SPIE Society
Group Author: Kawahira Hiroichi; Zurbrick Larry S
Published: SPIE,
Publication Dates: c2008.
Call Number: TN405.7-532/S989/2008
Book
Save to List
Saved in:
13
Photomask technology 2014 : 16-18 September 2014, Monterey, California, United States /

Cover is for reference only
Corporate Authors: BACUS Technical group; SPIE Society
Group Author: Ackmann, Paul W; Hayashi, Naoya
Published: SPIE,
Publication Dates: [2014]
Call Number: TN305.7-532/S989-2/2014
Book
Save to List
Saved in:
17
Photomask and X-ray mask technology VI 13-14 April, 1999, Yokohama, Japan

Cover is for reference only
Corporate Authors: BACUS (Technical group); Photomask Japan.
Published: SPIE,
Publication Dates: c1999.
Call Number: TN305.7-532/D575/1999/
Book
Save to List
Saved in:
18
Photomask and next-generation lithography mask technology XVI 8-10 April 2009, Yokohama, Japan

Cover is for reference only
Corporate Authors: BACUS (Technical group); SPIE (Society); Photomask Japan.
Group Author: Hosono Kunihiro.
Published: SPIE,
Publication Dates: c2009.
Call Number: TN305.7-532/P757/2009
Book
Save to List
Saved in:
Search Tools: Get RSS Feed — Email this Search —