Cover is for reference only

25th Annual BACUS Symposium on Photomask Technology：4-7 October, 2005, Monterey, California, USA

Saved in:
Bibliographic Details
Corporate Authors: Symposium on Photomask Technology (25th 2005 Monterey, California; BACUS Technical group; Society of Photo-Optical Instrumentation Engineers
Group Author: Weed J., Tracy; Martin Patrick M
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2005.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 5992
Subjects:
Integrated circuits > Masks
Microlithography
Carrier Form: 2 v.: ill. (some col.) ; 28 cm.
ISBN: 0819460141 (set)
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/S989/2005
Contents: Some earlier conferences have title: Symposium on Photomask Technology and Management.
Includes bibliographical references and author index.

Related Book Recommendations