Cover is for reference only

EMLC 2006：22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Saved in:
Bibliographic Details
Corporate Authors: European Mask and Lithography Conference (22nd 2006 Dresden, Germany; BACUS Technical group; Society of Photo-Optical Instrumentation Engineers; VDE/VDI-Gesellschaft f··ur Mikroelektronik, Mikro- und Feinwerktechnik
Group Author: Behringer Uwe F. W
Published: SPIE,
Publisher Address: Bellingham, Wash.,
Publication Dates: c2006.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 6281
Subjects:
Microlithography
Integrated circuits > Masks
Carrier Form: 1 v. (various pagings): ill. ; 28 cm.
ISBN: 0819463566
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/E897/2006
Contents: Includes bibliographical references and author index.

Related Book Recommendations