CMOS past, present and future /
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Main Authors: | |
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Corporate Authors: | |
Group Author: | ; ; |
Published: |
Woodhead Publishing,
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Publisher Address: | Duxford : |
Publication Dates: | 2018. |
Literature type: | eBook |
Language: | English |
Series: |
Woodhead Publishing series in electronic and optical materials
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Subjects: | |
Online Access: |
https://www.sciencedirect.com/science/book/9780081021392 http://www.sciencedirect.com/science/book/9780081021392 |
Item Description: | Includes index. |
Carrier Form: | 1 online resource(vii, 263 pages). |
ISBN: |
9780081021408 0081021402 |
Index Number: | TK7871 |
CLC: | TN432 |
Contents: | 1. Brief introduction CMOS applications in our daily life; 2. Basic definitions and equations; 3. Electrical measurements (IV, short channel effects, mobility and noise); 4. CMOS Architecture; 5. Strain engineering (stressor materials in source/drain regions, strain induced by processing, stress liners); 6. High-k and metal gate (Almost all known high-k materials and metal gates); 7. Channel materials (Ge, GeSn, SiGe, Graphene and other II-D crystals, III-V compounds); 8. Contacts (Silicide formation, contact resistance, parasitic contacts); 9. Integration with photonic components (CMOS with lasers, detectors); 10. Technology roadmap (starting from 50's to unknown future); 11. Authors' final words. |