Advances in mirror technology for X-ray, EUV lithography, laser and other applications II:5 August, 2004, Denver, Colorado, USA
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Corporate Authors: | |
---|---|
Group Author: | ; ; |
Published: |
SPIE,
|
Publisher Address: | Bellingham, Wash. |
Publication Dates: | c2004. |
Literature type: | Book |
Language: | English |
Series: |
SPIE proceedings series ; v. 5533 |
Subjects: | |
Carrier Form: | ix, 194 p.: ill. ; 28 cm. |
ISBN: | 0819454710 |
Index Number: | TH74 |
CLC: |
TH74-1 TH74-532 |
Call Number: | TH74-532/A244/2004 |
Contents: | Includes bibliographical references and author index. |