Cover is for reference only

Dry etching for microelectronics

Saved in:
Bibliographic Details
Group Author: Powell Ronald A
Published: North-Holland Physics Pub. Distributors for the USA and Canada, Elsevier Science Pub. Co.,
Publisher Address: Amsterdam New York New York, N.Y.
Publication Dates: 1984.
Literature type: Book
Language: English
Series: Materials processing--theory and practices ; v. 4
Subjects:
Plasma etching
Semiconductors > Etching
Carrier Form: xi, 299 p.: ill. ; 24 cm.
ISBN: 0444869050
Index Number: TN4
CLC: TN4
Call Number: TN4/D798/
Contents: Includes index.
Bibliography: p. 223-294.

Related Book Recommendations