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Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control

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Bibliographic Details
Corporate Authors: Symposium on Highly Selective Dry Etching and Damage Control (1993 Honolulu, Hawaii; Electrochemical Society. Electronics Division; Electrochemical Society. Dielectric Science and Technology Division
Group Author: Horiike Yasuhiro; Mathad G. S
Published: Electrochemical Society,
Publisher Address: Pennington, NJ
Publication Dates: c1993.
Literature type: Book
Language: English
Series: The Electrochemical Society proceedings ; v. 93-21
Subjects:
Plasma etching > Congresses
Semiconductors > Etching > Congresses
Carrier Form: x, 438 p.: ill. ; 23 cm.
ISBN: 1566770661
Index Number: TN405
CLC: TN405.98-532
Call Number: TN405.98-532/S989/1993/
Contents: Papers were presented at the USA-Japan joint symposium held in Honolulu, Hi., May 19-21, 1993.
Includes bibliographical references and indexes.

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