Advances in resist materials and processing technology XXIV:26-28 February, 2007, San Jose, California, USA

Saved in:
Bibliographic Details
Corporate Authors: SEMATECH, Inc; Society of Photo-Optical Instrumentation Engineers
Group Author: Lin Qinghuang 1963-
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2007.
Literature type: Book
Language: English
Series: Proceedings of SPIE ; v. 6519
Subjects:
Carrier Form: 2 v.: ill. ; 28 cm.
ISBN: 9780819466389
0819466387
Index Number: TS82
CLC: TS82-532
Call Number: TS82-532/A244/2007
Contents: Previous conference proceedings entitled: Advances in resist technology and processing.
Includes bibliographical references and author index.