Author Results for SEMATECH, Inc

SPIE Society
Society of Photo-Optical Instrumentation Engineers
SEMATECH, Inc
International SEMATECH
SEMATECH Organization
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(Micheal James),
Archie,Chas N
Dusa,Mircea V
Flagello,Donis G
John Alexander

1
Alternative lithographic technologies II 23-25 February 2010, San Jose, California, United States

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Corporate Authors: SEMATECH (Organization); SPIE (Society)
Group Author: Herr Daniel J. C.
Published: SPIE,
Publication Dates: c2010.
Call Number: TN405.7-532/E53/2010
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4
Extreme ultraviolet (EUV) lithography 22-25 February 2010, San Jose, California, United States

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Corporate Authors: SPIE Society; SEMATECH Organization
Group Author: La Fontaine Bruno M
Published: SPIE,
Publication Dates: 2010.
Call Number: TN41-532/E969/2010
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5
Alternative lithographic technologies 24-26 February 2009, San Jose, California, United States

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Corporate Authors: SPIE (Society)
Group Author: Schellenberg F. M., 1959-; La Fontaine Bruno M.
Published: SPIE,
Publication Dates: c2009.
Call Number: TN405.7-532/E53/2009
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7
Optical microlithography XXIII 23-25 February 2010, San Jose, California, United States

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Corporate Authors: SEMATECH Organization; SPIE Society
Group Author: Conley Willard; Dusa Mircea V
Published: SPIE,
Publication Dates: c2010.
Call Number: TS828-532/O62/2010
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9
Optical microlithography XXII 24-27 February 2009, San Jose, California, United States

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Corporate Authors: International SEMATECH; SPIE Society
Group Author: Dusa Mircea V; Levinson Harry J
Published: SPIE,
Publication Dates: c2009.
Call Number: TS828-532/O62/2009
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12
Optical microlithography XX 27 February - 2 March 2007, San Jose, California, USA

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Corporate Authors: SEMATECH, Inc; Society of Photo-Optical Instrumentation Engineers
Group Author: Flagello Donis G
Published: SPIE,
Publication Dates: c2007.
Call Number: TS828-532/O62/2007
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17
Optical microlithography XIX 21-24 February, 2006, San Jose, California, USA

Cover is for reference only
Corporate Authors: SEMATECH, Inc; Society of Photo-Optical Instrumentation Engineers
Group Author: Flagello Donis G
Published: SPIE,
Publication Dates: c2006.
Call Number: TS828-532/O62/2006
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18
Data analysis and modeling for process control III 23 February, 2006, San Jose, California, USA

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Corporate Authors: International SEMATECH
Group Author: Tobin Kenneth W; Emami Iraj
Published: SPIE,
Publication Dates: c2006.
Call Number: TP27-532/D232/2006
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