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Photomask and X-ray mask technology V：9-10 April, 1998, Kawasaki, Japan

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Bibliographic Details
Corporate Authors: BACUS (Technical group); Society of Photo-Optical Instrumentation Engineers; Photomask Japan.
Group Author: Aizaki Naoaki.
Published: SPIE,
Publisher Address: Bellingham, Washington
Publication Dates: c1998.
Literature type: Book
Language: English
Series: Proceedings / SPIE--the International Society for Optical Engineering ; v. 3412
Subjects:
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Masks (Electronics) > Congresses.
Carrier Form: xiii, 616 p.: ill. ; 28 cm.
ISBN: 0819428647
Index Number: TN305
CLC: TN305.7-532
Call Number: TN305.7-532/P575/1998/
Contents: Includes bibliographical references and index.

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