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Metrology, inspection, and process control for microlithography XVIII：23-26 February, 2004, Santa Clara, California, USA

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Bibliographic Details
Corporate Authors: Semiconductor Equipment and Materials International; International SEMATECH; Society of Photo-Optical Instrumentation Engineers
Group Author: Silver Richard M
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c2004.
Literature type: Book
Language: English
Series: SPIE proceedings series ; v. 5375
Subjects:
Integrated circuits > Measurement
Microlithography
Process control
Integrated circuits > Inspection
Carrier Form: 2 v. (xl, 1398 p.): ill. ; 28 cm.
ISBN: 0819452882
Index Number: TN405
CLC: TN405.7-532
Call Number: TN405.7-532/M594/2004
Contents: Includes bibliographical references and author index.

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