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Plasma deposition of amorphous silicon-based materials /

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference...

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Bibliographic Details
Corporate Authors: Elsevier Science & Technology
Group Author: Bruno, Giovanni; Capezzuto, Pio; Madan, A. Arun
Published: Academic Press,
Publisher Address: Boston :
Publication Dates: 1995.
Literature type: eBook
Language: English
Series: Plasma--materials interactions
Subjects:
Amorphous semiconductors > Design and construction
Silicon alloys
Plasma-enhanced chemical vapor deposition
TECHNOLOGY & ENGINEERING > Electronics > Solid State
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors
Semiconductors
Electronic books
Online Access: http://www.sciencedirect.com/science/book/9780121379407
Summary: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
Carrier Form: 1 online resource (xi, 324 pages) : illustrations.
Bibliography: Includes bibliographical references and index.
ISBN: 9780080539102
0080539106
1281054100
9781281054104
Index Number: TK7871
CLC: TN304.105.5
Contents: Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices.

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