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Photomask and next-generation lithography mask technology XX : 16-18 April 2013, Yokohama, Japan /

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Bibliographic Details
Corporate Authors: SPIE Society
Group Author: Kato, Kokoro
Published:
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 8701
Subjects:
Masks Electronics > Congresses
Integrated circuits > Masks > Congresses
X-ray lithography > Congresses
Microlithography > Congresses
Optoelectronic devices > Design and construction > Congresses
Mask technology
Photomask
Carrier Form: 1 v. (various pagings) : ill. ; 28 cm.
Bibliography: Includes bibliographical references and author index.
ISBN: 9780819494917 (pbk.) :
0819494917 (pbk.)
CLC: TN405.7-532
TN305.7-532
Call Number: TN305.7-532/P757/2013

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