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Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV : 22-26 February 2021, Online Only, United States /

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Bibliographic Details
Corporate Authors: Metrology, Inspection, and Process Control for Semiconductor Manufacturing (Conference) Online Only, United States); SPIE (Society)
Group Author: Adan, Ofer; Robinson, John C.
Published: SPIE,
Publisher Address: Bellingham, Washington :
Publication Dates: [2021]
Literature type: Book
Language: English
Series: Proceedings of SPIE, volume 11611
Subjects:
Integrated circuits > Measurement > Congresses.
Integrated circuits > Inspection > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Item Description: "At SPIE Advanced Lithography" -- Cover.
Carrier Form: 1 volume (various pagings) : illustrations, forms ; 28 cm.
Bibliography: Includes bibliographical references.
ISBN: 9781510640559 (paperback) :
CLC: TN405.7-532
Call Number: TN405.7-532/M594/2021

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