半导体制造基础 = Fundamentals of semiconductor fabrication
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Main Authors: | ; |
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Group Author: | |
Published: |
人民邮电出版社
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Publisher Address: | 北京 |
Publication Dates: | 2007 |
Literature type: | Book |
Language: | Chinese |
Series: |
图灵电子与电气工程丛书 |
Subjects: | |
Carrier Form: | 268页: 图 ; 24cm |
ISBN: | 978-7-115-16639-5 |
Index Number: | TN305 |
CLC: | TN305 |
Call Number: | TN305/4895 |
Contents: | 本书在简要介绍半导体制造流程的基础上,着力从理论和实践两个方面对晶体生长、硅氧化、光刻、刻蚀、扩散、离子注入和薄膜沉积等主要制备步骤进行详细探讨。 |