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X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography：9-13 July 1990, San Diego, California

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Bibliographic Details
Corporate Authors: International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (1990 San Diego, Calif.); Society of Photo-Optical Instrumentation Engineers
Group Author: Walker A. B. C; Hoover Richard B
Published: SPIE,
Publisher Address: Bellingham, Wash.
Publication Dates: c1991.
Literature type: Book
Language: English
Series: Proceedings / SPIE--the International Society for Optical Engineering ; v. 1343
Subjects:
Coatings > Congresses
Polarimetry > Instruments > Congresses
X-ray lithography > Congresses
X-ray optics > Instruments > Congresses
Carrier Form: xii, 579 p.: ill. ; 28 cm.
ISBN: 0819404047
Index Number: P172
CLC: P172.2-532
Call Number: P172.2-53/X8/1990/
Contents: "Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x.
Includes bibliographical references and index.

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